SK hynix and ASML early on Wednesday announced that they had assembled the industry's first Twinscan NXE:5200B High-NA EUV lithography system at the company's fab M16 in Icheon, South Korea. The device will initially serve as a development vehicle for next-generation process technologies, but eventually it will be used for mass production of DRAM using leading-edge process technologies a few years down the line.For SK hynix, the assembly of one of the industry's first Twinscan NXE:5200B EUV syst...